Abstract:Traditional preparation processes of silicon mainly include Czochralski, zone melting and vapor deposition method. Operation of these methods needs high temperature, large-scale equipments, complicated operation and high cost. Electrodeposited silicon at low temperature is favored by researchers due to its advantages of simple, controllable and low-cost preparation. Research status of low temperature electrodeposited silicon process is comprehensive overviewed, including selection of electrode and solvent, and electrodeposition method. Furthermore, Problems and development trends of low temperature electrodeposited silicon are discussed.